Monocrystalline magnesium oxide has good chemical stability, thermal conductivity and insulating properties at high temperature, and very small dielectric constant and loss at high frequency, which is an important industrializable single-crystal substrate for high-temperature superconducting films. Since the processing surface quality of the substrate seriously affects the performance of the high-temperature superconducting film grown on its surface, how to obtain an ultra-smooth and damage-free substrate surface is an urgent problem. Single-crystal magnesium oxide is a typical hard and brittle material, and the mechanical polishing process currently used in actual production has problems of low polishing efficiency, unstable processing quality and high fragmentation rate.
At present, the research on single crystal magnesium oxide ultra-precision processing technology is less, there is no complete set of ultra-precision processing technology specifically suitable for single crystal magnesium oxide. At present, most of the international chemical mechanical polishing (CMP) method is used to process the surface of single crystal magnesium oxide substrate, through the interaction of chemical and mechanical removal of surface damage layer, and efficiently obtain ultra-smooth and non-damaging single crystal magnesium oxide substrate surface.
Based on a large number of CMP experiments, the influence law of the main factors affecting the CMP process (such as polishing pad, polishing solution, polishing pressure, polishing disc speed, etc.) on the polishing effect of single-crystal magnesium oxide substrate was investigated. According to the physicochemical properties of...
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